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The following photos show the micromachined logo of ATOMKI. This logo was made in ATOMKI by the scanning nuclear microprobe on 30 µm thick SU-8 layer spuncoated on a Si wafer. The scanned figure resolution was 1024 pixel, the beam spot size was 1.5 µm, the scanned area was 1 mm2. The irradiated area was removed during chemical ethcing, the unirradiated area remained intact.
DF (dark field), focus on the top of the SU-8 resist
DF, focus on the Si wafer surface
DIC (Differential Interference Contrast)
These optical microscope images were taken on a Ziess Axio Imager microscope, that we purchased in the framework of the project GVOP-3.2.1.-2004-04-0402/3.0. There are a number of different microscope contrast techniques available:
- Bright Field: the most common contrast technique, some microscopes offer only this one method.
- Dark Field: the scattering centres will be bright using this method.
- DIC, Differential Interference Contrast microscopy: this method makes a virtual 3D image of the surface topography, which is very useful in some cases, sometimes it's only attractive.
- TIC, Total Interference Contrast microscopy: similar to DIC, the small heigth differences are converted to interference patterns, thus we can measure topographic information in the nanometre range.
Further reading about these techniques are on the Zeiss website.